Ultra Pure Chemicals
Acids
Hydrofluoric Acid
Hydrofluoric Acid may be used for Silicon Oxide etching when mixed with Ammonium Fluoride. This includes the etching of thermal and deposited oxides be they doped or undoped. Hydrofluoric Acid may also be mixed with Nitric Acid in various ratios to etch Silicon or Polysilicon substrates. In addition, HF may be diluted with De-ionised Water (dilutions ranging from 0.5% to 5%) and then used as part of the RCA type cleaning to remove thin native oxides which grow during the cleans. Other applications include the strip back of general topography, silox glass layer etch and quartz glass cleans..
Market Segments:
Functions:
Cleaner, Etchant