• • • Mixtures/Blends

Ultra Pure Chemicals

Mixtures/Blends

• Indium Tin Oxide (ITO) Etchants
• Nano-Strip
• Aluminium Etchants
• Buffered Oxide Etchants (BOE)
• Chromium Etchants
• Copper Plating
• Copper Etch

• Gold Etchants (Nitric/HCl)
• Gold Etchants (KI/l based)
• Poly Silicon Etchants
• Silicon Etchants
• Etchants for Titanium
• Etchants for Tantalum

Etchants for Titanium

Titanium reacts with Fluoride ions to form the soluble (TiF6)2- ion. Nitric Acid acts as an oxidant, controlling the rate of reaction. Selectivity is achieved by using Ammonium Fluoride as the source of F- ions thus limiting attack on underlying layers.

Market Segments:

• Semiconductor
• Plastic Electronics

Functions:

Etchant