Ultra Pure Chemicals
Bases
Tetramethylammonium Hydroxide (up to 25%)
Tetramethylammonium Hydroxide (TMAH) is widely used as a positive photoresist developer when diluted with De-ionised Water. A range of dilutions are available from 1% to 25%. TMAH may be used to etch and/or clean silicon either when it is used pure or when it is combined in high concentrations with Hydrogen Peroxide. Solutions of TMAH are available with or without surfactant.
Market Segments:
Functions:
Cleaner, Etchant, Photolithography