• • • Mixtures/Blends

Ultra Pure Chemicals

Mixtures/Blends

• Indium Tin Oxide (ITO) Etchants
• Nano-Strip
• Aluminium Etchants
• Buffered Oxide Etchants (BOE)
• Chromium Etchants
• Copper Plating
• Copper Etch

• Gold Etchants (Nitric/HCl)
• Gold Etchants (KI/l based)
• Poly Silicon Etchants
• Silicon Etchants
• Etchants for Titanium
• Etchants for Tantalum

Etchants for Tantalum

Tantalum is oxidised by Nitric Acid to Ta2O5 which subsequently reacts with HF to form a mixture of the soluble Fluoride ions (TaOF5)2- and (TaF6)-. When etching Ta/Al the Nitric Acid concentration is increased to facilitate the oxidation of Aluminium to Al2O3. This oxide reacts with HF to form soluble Al2F6.

Market Segments:

• Semiconductor

Functions:

Etchant