Ultra Pure Chemicals
Mixtures/Blends
Silicon Etchants
The chemical dissolution of Silicon occurs through reaction with Nitric Acid to form a layer of Silicon Dioxide. Subsequent reaction with HF forms soluble Fluorosilicate ions (SIF6 2-) which dissolve into the etchant. Acetic Acid and water are added to the mixture as diluents to moderate the rate of reaction. Silicon etchants based on Nitric and Hydrofluoric Acids are mainly isotropic in nature.
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Functions:
Etchant