Ultra Pure Chemicals
Bases
Potassium Hydroxide Solutions
At concentrations of 20% to 45%, Potassium Hydroxide may be used to etch silicon substrates. Potassium Hydroxide may also be mixed with Iso Propyl Alcohol or Glycols to form an anisotropic etch with a 55 to 1selectivity ratio for 100/111 silicons. Alternatively, Potassium Hydroxide may be mixed with alcohols and used for etching of polycrystalline silicon
Market Segments:
Functions:
Etchant