Ultra Pure Chemicals
Mixtures/Blends
Poly Silicon Etchants
Polysilicon reacts with Nitric Acid to form a surface layer of Silicon Dioxide (SiO2). The oxide layer subsequently reacts with HF to form soluble Fluorosilicate ions (SiF6 2-) which are dissolved into solution. Whilst the reaction is similar to that of pure Silicon, Polysilicon is etched much more rapidly due to its amorphous, rather than crystalline structure.
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Functions:
Etchant