Ultra Pure Chemicals
Mixtures/Blends
NanoStrip
Nano-strip comprises a stabilized formulation of Sulphuric Acid and Hydrogen Peroxide compounds. It removes positive and negative resists and other organic materials used in various applications in addition to general substrate cleaning. It contains high purity reagents required for high yield Sub 0.35 micron semiconductor manufacturing.
Market Segments:
Functions:
Resist Stripper, Cleaner
