Ultra Pure Chemicals
Solvents
Hexamethyldisilazane
Hexamethyldisilazane is used to remove water from silicon oxide or other substrate surfaces, reduce the surface tension and allow good resist adhesion. The product is used either as 100% or diluted with other co-solvents like PGMEA or Xylene depending on the resist used. Hexamethyldisilazane is applied to the substrate surface by spin, dip or vapour methods.
Market Segments:
Functions:
Photolithography