• • • Solvents

Ultra Pure Chemicals

Solvents

• Acetone
• n-Butyl Acetate
• Cyclopentanone
• Ethanol
• Ethylene Glycol
• Ethyl Lactate

• Hexamethyldisilazane
• Isopropyl Alcohol
• Methanol
• N- Methyl 2 Pyrrolidone
• Pgmea
• Xylene

Acetone

Acetone may be used for the removal of soft-baked photoresist and also for the general removal of organic residues from metal and non-metal substrates. Acetone may also be used as a drying agent and as an Edge Bead Remover for some positive resists.

Market Segments:

• Semiconductor
• Mems & Nanotechnology
• Plastic Electronics

Functions:

Cleaner, Resist Stripper, Photolithography