Compugraphics

Photomasks and Reticles

All semiconductor and related microelectronic components are mass-produced by a process similar to conventional photography, and photomasks and reticles perform a similar function to a negative in that process. In other words Compugraphics produces the master image or optical tooling by which all the subsequent products are manufactured. As such they are key enabling technology for an almost infinite number and variety of modern products.

Photomask Arrays

Multiple images of the final device or semiconductor wafer used in simpler lithographic processes to define all the functional characteristics and circuitry, including their layout on the substrate.

Reticle Patterns

Used at 1X, 2.5X, 4X or 5X reduction ratios in more sophisticated lithographic processes; these optical images also define all of the detail of the finished product, including device layout, critical dimensions and all functionality.

Phase Shift Masks

Reticles can be either simple clear and opaque optical images of the final device, or can use optical interference effects to enhance resolution at very small geometry. These are called phase shift mask because of the phase differences induced between selected parts of the image.

Photomask and Reticle Sets

Most microelectronic structures are three-dimensional and require more then one photomask or reticle to define the final product. Each of these images needs to be very accurately aligned to the other images. Some devices can have up to 100 different component layers or photomasks.

Data Processing and Design Services

The appropriate computer aided design tools and services support the manufacture of photomasks and reticles for customers.